JPH0138698Y2 - - Google Patents
Info
- Publication number
- JPH0138698Y2 JPH0138698Y2 JP13293185U JP13293185U JPH0138698Y2 JP H0138698 Y2 JPH0138698 Y2 JP H0138698Y2 JP 13293185 U JP13293185 U JP 13293185U JP 13293185 U JP13293185 U JP 13293185U JP H0138698 Y2 JPH0138698 Y2 JP H0138698Y2
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- laser beam
- light
- convex portion
- recognition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000758 substrate Substances 0.000 claims description 26
- 239000011521 glass Substances 0.000 description 6
- 230000000694 effects Effects 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 230000001678 irradiating effect Effects 0.000 description 2
- 230000003746 surface roughness Effects 0.000 description 2
- 235000012431 wafers Nutrition 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 239000005354 aluminosilicate glass Substances 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 229910000420 cerium oxide Inorganic materials 0.000 description 1
- 230000000994 depressogenic effect Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 238000005488 sandblasting Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000005361 soda-lime glass Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13293185U JPH0138698Y2 (en]) | 1985-08-30 | 1985-08-30 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13293185U JPH0138698Y2 (en]) | 1985-08-30 | 1985-08-30 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6244355U JPS6244355U (en]) | 1987-03-17 |
| JPH0138698Y2 true JPH0138698Y2 (en]) | 1989-11-20 |
Family
ID=31032776
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13293185U Expired JPH0138698Y2 (en]) | 1985-08-30 | 1985-08-30 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0138698Y2 (en]) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5365137B2 (ja) * | 2008-10-29 | 2013-12-11 | 東ソー株式会社 | フォトマスク用基板およびその製造方法 |
-
1985
- 1985-08-30 JP JP13293185U patent/JPH0138698Y2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6244355U (en]) | 1987-03-17 |
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